Simulations of sidewall profiles in reactive ion etching

PW May, D Field, DF Klemperer

Research output: Contribution to journal › Article (Academic Journal) › peer-review

Translated title of the contribution	Simulations of sidewall profiles in reactive ion etching
Original language	English
Pages (from-to)	598 - 606
Number of pages	8
Journal	Journal of Physics D: Applied Physics
Volume	26
Publication status	Published - 1993

Handle.net

@article{efd8858c6bc34bcea1f87fe91acb2e39,

title = "Simulations of sidewall profiles in reactive ion etching",

author = "PW May and D Field and DF Klemperer",

year = "1993",

language = "English",

volume = "26",

pages = "598 -- 606",

journal = "Journal of Physics D: Applied Physics",

issn = "0022-3727",

publisher = "IOP Publishing",

}