Small angle x-ray and neutron scattering studies of plasma-deposited amorphous silicon-hydrogen films

A. J. Leadbetter*, A. A.M. Rashid, R. M. Richardson, A. F. Wright, J. C. Knights

*Corresponding author for this work

Research output: Contribution to journalArticle (Academic Journal)peer-review

42 Citations (Scopus)

Abstract

Small-angle scattering measurements using both neutrons and X-rays have been made on a series of plasma-deposited a-Si : H films. One class of sample exhibits strong anisotropic scattering indicating rod-like microstructure normal to the film surface with a dominant rod diameter of ~ 60 Å. Other samples show isotropic scattering with a similar dimension or no scattering at all within the resolution of the experiment.

Original languageEnglish
Pages (from-to)973-977
Number of pages5
JournalSolid State Communications
Volume33
Issue number9
DOIs
Publication statusPublished - 1 Jan 1980

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