Surface diagnostics of dry etched III-V semiconductor samples using focused ion beam and secondary ion mass spectrometry

S Yu, PJ Heard, B Cakmak, RV Penty, IH White

Research output: Contribution to journalArticle (Academic Journal)peer-review

8 Citations (Scopus)
Translated title of the contributionSurface diagnostics of dry etched III-V semiconductor samples using focused ion beam and secondary ion mass spectrometry
Original languageEnglish
Article number6
Pages (from-to)3080 - 3084
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume17
DOIs
Publication statusPublished - Nov 1999

Bibliographical note

Publisher: American Vacuum Society

Cite this