Surface diagnostics of dry etched III-V semiconductor samples using focused ion beam and secondary ion mass spectrometry

S Yu; PJ Heard; B Cakmak; RV Penty; IH White

doi:10.1116/1.590958

Surface diagnostics of dry etched III-V semiconductor samples using focused ion beam and secondary ion mass spectrometry

S Yu, PJ Heard, B Cakmak, RV Penty, IH White

Interface Analysis Centre

Research output: Contribution to journal › Article (Academic Journal) › peer-review

9 Citations (Scopus)

Translated title of the contribution	Surface diagnostics of dry etched III-V semiconductor samples using focused ion beam and secondary ion mass spectrometry
Original language	English
Article number	6
Pages (from-to)	3080 - 3084
Number of pages	5
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	17
DOIs	https://doi.org/10.1116/1.590958
Publication status	Published - Nov 1999

Bibliographical note

Publisher: American Vacuum Society

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10.1116/1.590958

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Cite this

@article{09a0402d17e742eabc1e8ce3e6d025ef,

title = "Surface diagnostics of dry etched III-V semiconductor samples using focused ion beam and secondary ion mass spectrometry",

author = "S Yu and PJ Heard and B Cakmak and RV Penty and IH White",

note = "Publisher: American Vacuum Society",

year = "1999",

month = nov,

doi = "10.1116/1.590958",

language = "English",

volume = "17",

pages = "3080 -- 3084",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

}

Surface diagnostics of dry etched III-V semiconductor samples using focused ion beam and secondary ion mass spectrometry. / Yu, S; Heard, PJ; Cakmak, B et al.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 17, 6, 11.1999, p. 3080 - 3084.

Research output: Contribution to journal › Article (Academic Journal) › peer-review

TY - JOUR

T1 - Surface diagnostics of dry etched III-V semiconductor samples using focused ion beam and secondary ion mass spectrometry

AU - Yu, S

AU - Heard, PJ

AU - Cakmak, B

AU - Penty, RV

AU - White, IH

N1 - Publisher: American Vacuum Society

PY - 1999/11

Y1 - 1999/11

U2 - 10.1116/1.590958

DO - 10.1116/1.590958

M3 - Article (Academic Journal)

SN - 1071-1023

VL - 17

SP - 3080

EP - 3084

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

M1 - 6

ER -