Surface morphology evolution during electrodeposition of amorphous CoP films

RC Da Silva, AA Pasa, JJ Mallett, W Schwarzacher

Research output: Contribution to journalArticle (Academic Journal)peer-review

20 Citations (Scopus)

Abstract

We have used atomic force microscopy to measure the roughness of electrodeposited amorphous CoP as a function of length scale and film thickness. In contrast to the power law scaling usually observed for polycrystalline electrodeposited films in the absence of additives, the roughness decreases with increasing film thickness. For films grown on An on glass substrates, the characteristic lateral feature size is similar to250 nm, independent of the CoP thickness. This is consistent with columnar growth. Films of thickness 4 mum have a saturation roughness of only similar to1 nm, which is less than that of the substrates.
Translated title of the contributionSurface morphology evolution during electrodeposition of amorphous CoP films
Original languageEnglish
Pages (from-to)212 - 216
Number of pages5
JournalSurface Science
Volume576 (1-3)
Publication statusPublished - 2005

Bibliographical note

Publisher: Elsevier Science BV

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