Surface roughness and magnetic relaxation in electrodeposited systems

W. Schwarzacher; A. P. Robinson; P. Southern; K. N. Kutuso; A. A. Pasa; R. C. Da Silva

Surface roughness and magnetic relaxation in electrodeposited systems

W. Schwarzacher^*
, A. P. Robinson
, P. Southern
, K. N. Kutuso
, A. A. Pasa
, R. C. Da Silva

^*Corresponding author for this work

School of Physics

Research output: Chapter in Book/Report/Conference proceeding › Conference Contribution (Conference Proceeding)

Abstract

Two sets of experimental data for magnetic electrodeposits are described. We show how the surface roughness of electrodeposited amorphous CoP varies as a function of the film thickness for growth on smooth Au substrates. We also present thermal relaxation data for electrodeposited Ni-Cu/Cu multilayered nanowires deposited in nanoporous track-etched polycarbonate membranes from a single electrolyte.

Original language	English
Title of host publication	Magnetic Materials, Processes, and Devices VIII - Proceedings of the International Symposium
Pages	255-261
Number of pages	7
Publication status	Published - 2006
Event	206th ECS Meeting - Honolulu, HI, United States Duration: 5 Oct 2004 → 8 Oct 2004

Publication series

Name	Proceedings - Electrochemical Society
Volume	PV 2004-23

Conference

Conference	206th ECS Meeting
Country/Territory	United States
City	Honolulu, HI
Period	5/10/04 → 8/10/04

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@inproceedings{91cfa24fbf274e3189554a7a111d702f,

title = "Surface roughness and magnetic relaxation in electrodeposited systems",

abstract = "Two sets of experimental data for magnetic electrodeposits are described. We show how the surface roughness of electrodeposited amorphous CoP varies as a function of the film thickness for growth on smooth Au substrates. We also present thermal relaxation data for electrodeposited Ni-Cu/Cu multilayered nanowires deposited in nanoporous track-etched polycarbonate membranes from a single electrolyte.",

author = "W. Schwarzacher and Robinson, \{A. P.\} and P. Southern and Kutuso, \{K. N.\} and Pasa, \{A. A.\} and \{Da Silva\}, \{R. C.\}",

year = "2006",

language = "English",

isbn = "1566775132",

series = "Proceedings - Electrochemical Society",

pages = "255--261",

booktitle = "Magnetic Materials, Processes, and Devices VIII - Proceedings of the International Symposium",

note = "206th ECS Meeting ; Conference date: 05-10-2004 Through 08-10-2004",

}

Schwarzacher, W, Robinson, AP, Southern, P, Kutuso, KN, Pasa, AA & Da Silva, RC 2006, Surface roughness and magnetic relaxation in electrodeposited systems. in Magnetic Materials, Processes, and Devices VIII - Proceedings of the International Symposium. Proceedings - Electrochemical Society, vol. PV 2004-23, pp. 255-261, 206th ECS Meeting, Honolulu, HI, United States, 5/10/04.

Surface roughness and magnetic relaxation in electrodeposited systems. / Schwarzacher, W.; Robinson, A. P.; Southern, P. et al.
Magnetic Materials, Processes, and Devices VIII - Proceedings of the International Symposium. 2006. p. 255-261 (Proceedings - Electrochemical Society; Vol. PV 2004-23).

Research output: Chapter in Book/Report/Conference proceeding › Conference Contribution (Conference Proceeding)

TY - GEN

T1 - Surface roughness and magnetic relaxation in electrodeposited systems

AU - Schwarzacher, W.

AU - Robinson, A. P.

AU - Southern, P.

AU - Kutuso, K. N.

AU - Pasa, A. A.

AU - Da Silva, R. C.

PY - 2006

Y1 - 2006

N2 - Two sets of experimental data for magnetic electrodeposits are described. We show how the surface roughness of electrodeposited amorphous CoP varies as a function of the film thickness for growth on smooth Au substrates. We also present thermal relaxation data for electrodeposited Ni-Cu/Cu multilayered nanowires deposited in nanoporous track-etched polycarbonate membranes from a single electrolyte.

AB - Two sets of experimental data for magnetic electrodeposits are described. We show how the surface roughness of electrodeposited amorphous CoP varies as a function of the film thickness for growth on smooth Au substrates. We also present thermal relaxation data for electrodeposited Ni-Cu/Cu multilayered nanowires deposited in nanoporous track-etched polycarbonate membranes from a single electrolyte.

UR - https://www.scopus.com/pages/publications/40249093618

M3 - Conference Contribution (Conference Proceeding)

AN - SCOPUS:40249093618

SN - 1566775132

SN - 9781566775137

T3 - Proceedings - Electrochemical Society

SP - 255

EP - 261

BT - Magnetic Materials, Processes, and Devices VIII - Proceedings of the International Symposium

T2 - 206th ECS Meeting

Y2 - 5 October 2004 through 8 October 2004

ER -

Surface roughness and magnetic relaxation in electrodeposited systems

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