Translated title of the contribution | Synthesis of Aluminium Oxide Thin Films: Use of Aluminum Tris-dipivaloylmethanate as a New Low Pressure Metal Organic Chemical Vapour Deposition Precursor |
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Original language | English |
Pages (from-to) | 1624 - 1626 |
Journal | Applied Physics Letters |
Volume | 67 |
Publication status | Published - 1995 |
Synthesis of Aluminium Oxide Thin Films: Use of Aluminum Tris-dipivaloylmethanate as a New Low Pressure Metal Organic Chemical Vapour Deposition Precursor
E Ciliberto, I Fragala, R Rizza, G Spoto, GC Allen
Research output: Contribution to journal › Article (Academic Journal) › peer-review
27
Citations
(Scopus)