Synthesis of Aluminium Oxide Thin Films: Use of Aluminum Tris-dipivaloylmethanate as a New Low Pressure Metal Organic Chemical Vapour Deposition Precursor

E Ciliberto, I Fragala, R Rizza, G Spoto, GC Allen

Research output: Contribution to journalArticle (Academic Journal)

27 Citations (Scopus)
Translated title of the contributionSynthesis of Aluminium Oxide Thin Films: Use of Aluminum Tris-dipivaloylmethanate as a New Low Pressure Metal Organic Chemical Vapour Deposition Precursor
Original languageEnglish
Pages (from-to)1624 - 1626
JournalApplied Physics Letters
Volume67
Publication statusPublished - 1995

Cite this