Synthesis of Aluminium Oxide Thin Films: Use of Aluminum Tris-dipivaloylmethanate as a New Low Pressure Metal Organic Chemical Vapour Deposition Precursor

E Ciliberto; I Fragala; R Rizza; G Spoto; GC Allen

Synthesis of Aluminium Oxide Thin Films: Use of Aluminum Tris-dipivaloylmethanate as a New Low Pressure Metal Organic Chemical Vapour Deposition Precursor

E Ciliberto, I Fragala, R Rizza, G Spoto, GC Allen

Research output: Contribution to journal › Article (Academic Journal) › peer-review

27 Citations (Scopus)

Translated title of the contribution	Synthesis of Aluminium Oxide Thin Films: Use of Aluminum Tris-dipivaloylmethanate as a New Low Pressure Metal Organic Chemical Vapour Deposition Precursor
Original language	English
Pages (from-to)	1624 - 1626
Journal	Applied Physics Letters
Volume	67
Publication status	Published - 1995

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@article{01e0f715fef44866b421cf15e8f4e366,

title = "Synthesis of Aluminium Oxide Thin Films: Use of Aluminum Tris-dipivaloylmethanate as a New Low Pressure Metal Organic Chemical Vapour Deposition Precursor",

author = "E Ciliberto and I Fragala and R Rizza and G Spoto and GC Allen",

year = "1995",

language = "English",

volume = "67",

pages = "1624 -- 1626",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics (AIP)",

}

TY - JOUR

T1 - Synthesis of Aluminium Oxide Thin Films: Use of Aluminum Tris-dipivaloylmethanate as a New Low Pressure Metal Organic Chemical Vapour Deposition Precursor

AU - Ciliberto, E

AU - Fragala, I

AU - Rizza, R

AU - Spoto, G

AU - Allen, GC

PY - 1995

Y1 - 1995

M3 - Article (Academic Journal)

VL - 67

SP - 1624

EP - 1626

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

ER -