Technology and application of in-situ AlOx layers on III-V semiconductors

R. Kúdela, J. Šoltýs, M. Kučera, R. Stoklas, F. Gucmann, M. Blaho, M. Mičušík, O. Pohorelec, M. Gregor, I. Brytavskyi, E. Dobročka, D. Gregušová*

*Corresponding author for this work

Research output: Contribution to journalArticle (Academic Journal)peer-review

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Engineering & Materials Science

Chemical Compounds