The atomic fabrication of a silicon based quantum computer

MY Simmons; SR Schofield; JL O'Brien; NJ Curson; RG Clark; TM Buehler; RP McKinnon; R Brenner; DJ Reilly; AS Dzurak; AR Hamilton

doi:10.1109/NANO.2001.966469

The atomic fabrication of a silicon based quantum computer

MY Simmons, SR Schofield, JL O'Brien, NJ Curson, RG Clark, TM Buehler, RP McKinnon, R Brenner, DJ Reilly, AS Dzurak, AR Hamilton

Research output: Chapter in Book/Report/Conference proceeding › Conference Contribution (Conference Proceeding)

1 Citation (Scopus)

Abstract

Presents recent results on two different approaches to realize a solid-state quantum computer based in silicon, using phosphorus atoms as qubits. In the first approach the device is built from the 'bottomup' using a combination of atomic lithography with a scanning tunneling microscope and high quality silicon epitaxial growth using molecular beam epitaxy. In the second approach ion implantation is used to implant the phosphorus atoms from the 'top-down'. In both cases surface control electrodes are fabricated by conventional electron beam lithography. Techniques for qubit read-out utilising coincidence measurements on twin single electron transistors are also presented

Translated title of the contribution	The atomic fabrication of a silicon based quantum computer
Original language	English
Title of host publication	1st IEEE Conference on Nanotechnology, 2001 (NANO 2001), Maui, HI
Publisher	Institute of Electrical and Electronics Engineers (IEEE)
Pages	471 - 476
Number of pages	6
DOIs	https://doi.org/10.1109/NANO.2001.966469
Publication status	Published - 28 Oct 2001

Access to Document

10.1109/NANO.2001.966469

Handle.net

Persistent link

Cite this

Simmons, MY., Schofield, SR., O'Brien, JL., Curson, NJ., Clark, RG., Buehler, TM., McKinnon, RP., Brenner, R., Reilly, DJ., Dzurak, AS., & Hamilton, AR. (2001). The atomic fabrication of a silicon based quantum computer. In 1st IEEE Conference on Nanotechnology, 2001 (NANO 2001), Maui, HI (pp. 471 - 476). Institute of Electrical and Electronics Engineers (IEEE). https://doi.org/10.1109/NANO.2001.966469

@inproceedings{823442f782b84d3ba915b87705b0acb7,

title = "The atomic fabrication of a silicon based quantum computer",

abstract = "Presents recent results on two different approaches to realize a solid-state quantum computer based in silicon, using phosphorus atoms as qubits. In the first approach the device is built from the 'bottomup' using a combination of atomic lithography with a scanning tunneling microscope and high quality silicon epitaxial growth using molecular beam epitaxy. In the second approach ion implantation is used to implant the phosphorus atoms from the 'top-down'. In both cases surface control electrodes are fabricated by conventional electron beam lithography. Techniques for qubit read-out utilising coincidence measurements on twin single electron transistors are also presented",

author = "MY Simmons and SR Schofield and JL O'Brien and NJ Curson and RG Clark and TM Buehler and RP McKinnon and R Brenner and DJ Reilly and AS Dzurak and AR Hamilton",

year = "2001",

month = oct,

day = "28",

doi = "10.1109/NANO.2001.966469",

language = "English",

pages = "471 -- 476",

booktitle = "1st IEEE Conference on Nanotechnology, 2001 (NANO 2001), Maui, HI",

publisher = "Institute of Electrical and Electronics Engineers (IEEE)",

address = "United States",

}

Simmons, MY, Schofield, SR, O'Brien, JL, Curson, NJ, Clark, RG, Buehler, TM, McKinnon, RP, Brenner, R, Reilly, DJ, Dzurak, AS & Hamilton, AR 2001, The atomic fabrication of a silicon based quantum computer. in 1st IEEE Conference on Nanotechnology, 2001 (NANO 2001), Maui, HI. Institute of Electrical and Electronics Engineers (IEEE), pp. 471 - 476. https://doi.org/10.1109/NANO.2001.966469

TY - GEN

T1 - The atomic fabrication of a silicon based quantum computer

AU - Simmons, MY

AU - Schofield, SR

AU - O'Brien, JL

AU - Curson, NJ

AU - Clark, RG

AU - Buehler, TM

AU - McKinnon, RP

AU - Brenner, R

AU - Reilly, DJ

AU - Dzurak, AS

AU - Hamilton, AR

PY - 2001/10/28

Y1 - 2001/10/28

N2 - Presents recent results on two different approaches to realize a solid-state quantum computer based in silicon, using phosphorus atoms as qubits. In the first approach the device is built from the 'bottomup' using a combination of atomic lithography with a scanning tunneling microscope and high quality silicon epitaxial growth using molecular beam epitaxy. In the second approach ion implantation is used to implant the phosphorus atoms from the 'top-down'. In both cases surface control electrodes are fabricated by conventional electron beam lithography. Techniques for qubit read-out utilising coincidence measurements on twin single electron transistors are also presented

AB - Presents recent results on two different approaches to realize a solid-state quantum computer based in silicon, using phosphorus atoms as qubits. In the first approach the device is built from the 'bottomup' using a combination of atomic lithography with a scanning tunneling microscope and high quality silicon epitaxial growth using molecular beam epitaxy. In the second approach ion implantation is used to implant the phosphorus atoms from the 'top-down'. In both cases surface control electrodes are fabricated by conventional electron beam lithography. Techniques for qubit read-out utilising coincidence measurements on twin single electron transistors are also presented

U2 - 10.1109/NANO.2001.966469

DO - 10.1109/NANO.2001.966469

M3 - Conference Contribution (Conference Proceeding)

SP - 471

EP - 476

BT - 1st IEEE Conference on Nanotechnology, 2001 (NANO 2001), Maui, HI

PB - Institute of Electrical and Electronics Engineers (IEEE)

ER -

The atomic fabrication of a silicon based quantum computer

Abstract

Access to Document

Handle.net

Fingerprint

Cite this