The atomic fabrication of a silicon based quantum computer

MY Simmons, SR Schofield, JL O'Brien, NJ Curson, RG Clark, TM Buehler, RP McKinnon, R Brenner, DJ Reilly, AS Dzurak, AR Hamilton

Research output: Chapter in Book/Report/Conference proceedingConference Contribution (Conference Proceeding)

1 Citation (Scopus)


Presents recent results on two different approaches to realize a solid-state quantum computer based in silicon, using phosphorus atoms as qubits. In the first approach the device is built from the 'bottomup' using a combination of atomic lithography with a scanning tunneling microscope and high quality silicon epitaxial growth using molecular beam epitaxy. In the second approach ion implantation is used to implant the phosphorus atoms from the 'top-down'. In both cases surface control electrodes are fabricated by conventional electron beam lithography. Techniques for qubit read-out utilising coincidence measurements on twin single electron transistors are also presented
Translated title of the contributionThe atomic fabrication of a silicon based quantum computer
Original languageEnglish
Title of host publication1st IEEE Conference on Nanotechnology, 2001 (NANO 2001), Maui, HI
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Pages471 - 476
Number of pages6
Publication statusPublished - 28 Oct 2001


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