The modelling of sidewall profiles produced during reactive ion etching

IM Hedgecock, PW May, D Field, DF Klemperer

Research output: Chapter in Book/Report/Conference proceeding › Conference Contribution (Conference Proceeding)

Translated title of the contribution	The modelling of sidewall profiles produced during reactive ion etching
Original language	English
Title of host publication	Unknown
Pages	921 - 926
Number of pages	5
Volume	3
Publication status	Published - 1993

Conference Proceedings/Title of Journal: 11th Intl. Symp. on Plasma Chem

Handle.net

@inproceedings{1bb8407554da4b7aa0bf8268cb7160e8,

title = "The modelling of sidewall profiles produced during reactive ion etching",

author = "IM Hedgecock and PW May and D Field and DF Klemperer",

note = "Conference Proceedings/Title of Journal: 11th Intl. Symp. on Plasma Chem",

year = "1993",

language = "English",

volume = "3",

pages = "921 -- 926",

booktitle = "Unknown",

}