Ultrafine electrolytically deposited multilayered Co/Cu- and CoNi/Cu-films on an arsenide gallium

VM Fedosyuk, W Schwarzacher, OI Kasyutich

Research output: Contribution to journal › Article (Academic Journal) › peer-review

Translated title of the contribution	Ultrafine electrolytically deposited multilayered Co/Cu- and CoNi/Cu-films on an arsenide gallium
Original language	English
Pages (from-to)	42 - 47
Journal	Metallofizika I Noveishie Tekhnologii
Volume	22
Publication status	Published - 2000

Publisher: Natl Acad Sciences Ukraine, Inst Metal Physics

Handle.net

@article{387257cc21ea4562aa613306e2e5760f,

title = "Ultrafine electrolytically deposited multilayered Co/Cu- and CoNi/Cu-films on an arsenide gallium",

author = "VM Fedosyuk and W Schwarzacher and OI Kasyutich",

note = "Publisher: Natl Acad Sciences Ukraine, Inst Metal Physics",

year = "2000",

language = "English",

volume = "22",

pages = "42 -- 47",

journal = "Metallofizika I Noveishie Tekhnologii",

issn = "0204-3580",

publisher = "Natsional'na Akademiya Nauk Ukrainy",

}

TY - JOUR

T1 - Ultrafine electrolytically deposited multilayered Co/Cu- and CoNi/Cu-films on an arsenide gallium

AU - Fedosyuk, VM

AU - Schwarzacher, W

AU - Kasyutich, OI

N1 - Publisher: Natl Acad Sciences Ukraine, Inst Metal Physics

PY - 2000

Y1 - 2000

M3 - Article (Academic Journal)

VL - 22

SP - 42

EP - 47

JO - Metallofizika I Noveishie Tekhnologii

JF - Metallofizika I Noveishie Tekhnologii

SN - 0204-3580

ER -