Understanding the chemical vapor deposition of diamond: recent progress

J. E. Butler, Y. A. Mankelevich, A. Cheesman, Jie Ma, M. N. R. Ashfold

Research output: Contribution to journalReview article (Academic Journal)peer-review

162 Citations (Scopus)

Abstract

In this paper we review and provide an overview to the understanding of the chemical vapor deposition (CVD) of diamond materials with a particular focus on the commonly used microwave plasma-activated chemical vapor deposition (MPCVD). The major topics covered are experimental measurements in situ to diamond CVD reactors, and MPCVD in particular, coupled with models of the gas phase chemical and plasma kinetics to provide insight into the distribution of critical chemical species throughout the reactor, followed by a discussion of the surface chemical process involved in diamond growth.

Original languageEnglish
Article number364201
Pages (from-to)-
Number of pages20
JournalJournal of Physics Condensed Matter
Volume21
Issue number36
DOIs
Publication statusPublished - 9 Sep 2009

Cite this